Our paper “Wavelength-scale ptychographic coherent diffractive imaging using a high-order harmonic source”, which was the result of a collaboration between several Jena-based groups collaborating in a Forschergruppe in the State of Thuringia (2015 FGR 0094), has just been published in Scientific Reports. In this work, a full-field imaging resolution of 45 nm, corresponding to 2.5 wavelengths, was achieved using an advanced XUV source at the Institute of Applied Physics at FSU Jena. For better comparison of results in XUV imaging a Rayleigh-type criterion is used as a direct and unambiguous resolution metric for high-resolution table-top setup. This reliably qualifes this imaging system for real-world applications e.g. in biological sciences, material sciences, imaging integrated circuits and semiconductor mask inspection.
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